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Computational Lithography

Arce, Gonzalo R. Ma, Xu

Wiley Series in Pure and Applied Optics

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Innbundet

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Leveringstid: 7-30 dager

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Omtale

This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches.

  • Utgivelsesdato:

    06.08.2010

  • ISBN/Varenr:

    9780470596975

  • Språk:

    , Engelsk

  • Forlag:

    John Wiley & Sons Inc

  • Fagtema:

    Teknologi, ingeniørfag, landbruk og industri

  • Litteraturtype:

    Faglitteratur

  • Sider:

    256

  • Høyde:

    24.1 cm

  • Bredde:

    16 cm

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