
Plasma Etching : Fundamentals and Applications
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Handlinger
Beskrivelse
Omtale
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Detaljer
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Utgivelsesdato:
28.05.1998
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ISBN:
9780198562870
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Språk:
, Engelsk
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Forlag:
Oxford University Press -
Fagtema:
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Serie:
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Litteraturtype:
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Sider:
356
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Høyde:
24.2 cm
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Bredde:
16.3 cm