Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications

Omtale

This book focusses on the spacer engineering aspects of novel MOS-based devicecircuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.