Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applications
Sherman, Arthur Kaariainen, Tommi Kaariainen, Marja-Leena Cameron, David
Innbundet
I salg
Leveringstid: 7-30 dager
Handlinger
Beskrivelse
Omtale
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
Detaljer
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Utgivelsesdato:
28.06.2013
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ISBN/Varenr:
9781118062777
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Språk:
, Engelsk
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Forlag:
Wiley-Scrivener
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Fagtema:
Teknologi, ingeniørfag, landbruk og industri
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Litteraturtype:
-
Utgave:
2
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Sider:
272
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Høyde:
16.4 cm
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Bredde:
24 cm